|
For more information, please refer to details.
Material
- Al2O3 ,99.6% Hi-Rel + Hybrid grade
Dimension: 4.5" x 3.75"
Thickness: 10 - 50 mil
- AlN
Dimension: 4.5" x 3.75"
Thickness: 25 - 40 mil
Metallization by sputtering
Electroplating
- Au (purity 99,99% hardness 90 max VHN20)
Thickness: 3 - 5 µm
Gold deposit meets the requirements of the relevant specification for bonding, soldering and purity. (MIL 883C, MIL 202F, MIL-G-45204C)
Conductors
- Metallization lay-up NiCr-Ni-Au-Au
- Line width Min. 25 ± 4 µm
- Gap width Min. 25 ± 4 µm
Resistors
- Sheet resistivity 50, 100,200

- Line width
Not trimmable Min. 100µm
RF-trimmable Min. 150µm
Trimmable Min. 250µm
- Line width tolerance ± 2.5 µm
- Gap width Min. 100µm
- Probe pads Min. 300*300 µm2
- Power dissipation
Rsq 50 Max. 180 mW/mm2
Rsq 100 Max. 120 mW/mm2
Rsq 200 Max. 80 mW/mm2
Metallized vias
- Hole diameter Min. 300 µm
- Distance between vias Min. 200 µm
- Distance to resistor Min.150 µm
- Vias / inch2 substrate Via 300 µm Max. 18
- Land dimension for via Diameter via + 300µm
- Alignment accuracy ± 50 µm
|